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AP-3P Atmospheric Plasma System

ANDA AP-3P atmospheric plasma cleaning machine for PCBA and electronic packaging. It achieves surface activation and micro-residue removal at atmospheric pressure, improving bonding and coating adhesion without substrate damage.

ANDA AP-3P Atmospheric Plasma System is a normal-pressure plasma surface treatment equipment. It requires no vacuum chamber and supports offline or semi-automatic processing of workpieces. It is widely used for surface cleaning, activation and etching of PCBA, FPC, and small semiconductor packages. It effectively enhances surface wettability and significantly improves the adhesion of glue, coating and bonding layers. Compact footprint makes it suitable for small-batch production and laboratory verification.

Key Features

  • Atmospheric plasma technology, no vacuum pump, low operating & maintenance cost

  • Compact cabinet design, saves factory floor space

  • Precision plasma nozzle, uniform treatment for small electronic components

  • Gentle plasma output, prevents thermal damage to sensitive substrates

  • Simple operation with human-machine interface, easy recipe storage and recall

  • Main applications: pre-treatment for coating, dispensing and bonding

Specifications

Item Parameter
Model AP-3P
Working Condition Atmospheric Pressure
Processing Mode Semi-automatic batch processing
Workpiece Size (Max) 350 × 350 mm
Z-axis Height 5~50 mm adjustable
Plasma Nozzle Rotary nozzle, optional straight nozzle
Plasma Power 100 ~ 800 W adjustable
Motion Speed 10 ~ 500 mm/s
Positioning Accuracy ±0.05 mm
Control System Industrial PC + Windows OS, recipe storage up to 999 groups
Power Supply AC220V, 50/60Hz, 3.5kVA
Gas Source Compressed dry air / Nitrogen (0.4~0.7 MPa)
Machine Dimension 900 × 950 × 1650 mm
Weight Approx. 480 kg
Applicable Workpiece PCBA, FPC, small IC packages, plastic parts
Function Surface cleaning, activation, micro etching, adhesion improvement


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